location： Current position: Home >> Scientific Research >> Paper Publications

Atomic layer etching of SiO2 under Ar/C4F8 plasmas with pulsed bias

Hits:

Indexed by:会议论文

Date of Publication:2015-01-01

Pre One:强流脉冲离子束辐照对金属玻璃Zr53Al23.5Cu5.9Co17.6结构和性能的影响

Next One:Resistance to He2+ irradiation damage in metallic glass Fe 80 Si 7.43 B 12.57
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep