Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2009-11-10

Journal: MODERN PHYSICS LETTERS B

Included Journals: Scopus、SCIE

Volume: 23

Issue: 28

Page Number: 3409-3417

ISSN: 0217-9849

Key Words: Dual frequency; capacitively coupled plasmas; non-uniformity

Abstract: Radial non-uniformities of dual frequency capacitively coupled argon plasma were experimentally studied, using an optical emission spectroscopy probe, for different discharge pressures, discharge gaps, and frequencies and powers of the low frequency source. It was shown that the plasma emission profiles strongly depend on the working gas pressure and the lower frequency (LF) power. With the increasing LF power the emission profiles changed from a bell-shaped distribution at low LF power to a double-peak distribution at high LF power.