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Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates

Paper Publications

[171]You Zuowei, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Simulation of Capacitively Coupled Dual-Frequency N-2, O-2, N-2/O-2 Discharges: Effects of Exte...[J],PLASMA SCIENCE & TECHNOLOGY,2014,16(4):335-343
[172]Hu, Zhang-Hu, Chen, Mao-Du, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Current neutralization and plasma polarization for intense ion beams propagating through magnet...[J],FRONTIERS OF PHYSICS,2014,9(2):226-233
[173]Liu, Jia, Yong-Xin, Bi, Zhen-Hua, Gao, Fei, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelectron Technol, Dalian 116024, Peoples R China..Experimental investigations of electron density and ion energy distributions in dual-frequency ...[J],JOURNAL OF APPLIED PHYSICS,2014,115(1)
[174]梅显秀, 羌建兵, 王友年.Effects on structure and properties of Zr 55 Al 10 Cu 30 Ni 5 metallic glass irradiated by high i...[J],Applied Surface Science 313 (2014) 911–917,2014,313(6):911-917
[175]宋远红, 王友年.Analyzing nonlocal effects in the plasmon spectra of a metal slab by the Greens function techniqu...[J],Nanoscale Syst.: Math. Model. Theory Appl.,2014,3(3):44-54
[176]梅显秀, 王友年, 董闯.Resistance to He induced irradiation damage in metallic glass Zr 64 Cu 17.8 Ni 10.7 Al 7.5[J],Journal of Nuclear Materials 444 (2014) 342–348,2014,444(1):342-348
[177]戴忠玲, 王友年.Atomic Layer Etching of Silicon and Silicon Dioxide Under Pulsed RF Substrate Bias[A],2014,1(1):33-33
[178]高飞, 王友年, 张钰如, 赵书霞, 宋远红.Experimental and Numerical Studies of Pulse-Modulated ICP Discharges[A],2014,36-36
[179]刘永新, 高飞, 王友年.Experimental investigations of electron density and ion energy distributions in dual-frequency ca...[J],J. Appl. Phys.,2014,115(1):13301-13301
[180]Zhang, Sai-Qian, Dai, Zhong-Ling, Song, Yuan-Hong, Wang, You-Nian, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Effect of reactant transport on the trench profile evolution for silicon etching in chlorine pl...[J],VACUUM,2014,99:180-188

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