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论文类型：期刊论文

发表时间：2018-02-01

发表刊物：PHYSICS OF PLASMAS

收录刊物：SCIE、EI、Scopus

卷号：25

期号：2

ISSN号：1070-664X

摘要：The dependence of the electron density and the emission intensity on external parameters during the transitions of the electron power absorption mode is experimentally studied in asymmetric electropositive (neon) and electronegative (CF4) capacitively coupled radio-frequency plasmas. The spatio-temporal distribution of the emission intensity is measured with phase resolved optical emission spectroscopy and the electron density at the discharge center is measured by utilizing a floating hairpin probe. In neon discharge, the emission intensity increases almost linearly with the rf voltage at all driving frequencies covered here, while the variation of the electron density with the rf voltage behaves differently at different driving frequencies. In particular, the electron density increases linearly with the rf voltage at high driving frequencies, while at low driving frequencies the electron density increases slowly at the low-voltage side and, however, grows rapidly, when the rf voltage is higher than a certain value, indicating a transition from alpha to gamma mode. The rf voltage, at which the mode transition occurs, increases with the decrease of the driving frequency/ the working pressure. By contrast, in CF4 discharge, three different electron power absorption modes can be observed and the electron density and emission intensity do not exhibit a simple dependence on the rf voltage. In particular, the electron density exhibits a minimum at a certain rf voltage when the electron power absorption mode is switching from drift-ambipolar to the alpha/gamma mode. A minimum can also be found in the emission intensity at a higher rf voltage when a discharge is switching into the gamma mode. Published by AIP Publishing.