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论文类型:期刊论文
发表时间:2015-01-01
发表刊物:Physcis of Plasmas
卷号:22
期号:4
页面范围:43508-43508
上一条:Modeling and experimental investigation of the plasma uniformity in CF4/O2
下一条:Characterization of O2/Ar inductively coupled plasma studied by using a Langmuir probe and global model