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论文类型：期刊论文

发表时间：2013-11-01

发表刊物：PHYSICS OF PLASMAS

收录刊物：SCIE、EI、Scopus

卷号：20

期号：11

ISSN号：1070-664X

摘要：A combined spectroscopic method of absorption, actinometry, and relative optical emission intensity is employed to determine the absolute CF2 density, the relative F and H densities, H atom excitation temperature and the electron density in dual-frequency (60/2 MHz) capacitively coupled CHF3/Ar plasmas. The effects of different control parameters, such as high-frequency (HF) power, low-frequency (LF) power, gas pressure, gap length and content of CHF3, on the concentration of radical CF2, F, and H and excitation temperature are discussed, respectively. It is found that the concentration of CF2 is strongly dependent on the HF power, operating pressure and the proportion of CHF3 in feed gas, while it is almost independent of the LF power and the gap length. A higher concentration ratio of F to CF2 could be obtained in dual-frequency discharge case. Finally, the generation and decay mechanisms of CF2 and F were also discussed. (C) 2013 AIP Publishing LLC.