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论文类型：期刊论文

发表时间：2013-09-01

发表刊物：PLASMA SCIENCE & TECHNOLOGY

收录刊物：SCIE、EI、Scopus

卷号：15

期号：9

页面范围：885-890

ISSN号：1009-0630

关键字：dual-frequency capacitively coupled plasma (DF CCP); gas temperature; electron temperature; fluorine atom concentration

摘要：Optical emission spectroscopy measurements of dual-frequency capacitively coupled CF4 plasmas were carried out. The gas temperature (T-g) was acquired by fitting the optical emission spectra of a CF B-X system in 201 similar to 206 nm. The atomic fluorine concentration and the electron temperature (T-e) were obtained by trace rare gas optical emission spectroscopy and a modified Boltzmann plot technique, respectively. It was found that the gas temperature was about 620 30 K at 50 mTorr and the atomic fluorine concentration increased while the electron temperature decreased with increasing gas pressure and power of high frequency (60 MHz). With increasing low frequency (2 MHz) power, the electron temperature also increased, but the atomic fluorine concentration was insensitive to this change. The generation and disappearance mechanisms of F atoms are discussed.