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发布时间：2019-03-09

论文类型：期刊论文

发表时间：2012-11-01

发表刊物：PHYSICS OF PLASMAS

收录刊物：Scopus、EI、SCIE

卷号：19

期号：11

ISSN号：1070-664X

摘要：We developed a one-dimensional hybrid model to simulate the dc/RF combined driven capacitively coupled plasma for CF4 discharges. The numerical results show the influence of the dc source on the plasma density distribution, ion energy distributions (IEDs), and ion angle distributions (IADs) on both RF and dc electrodes. The increase of dc voltage impels more ions with high energy to the electrode applied to the dc source, which makes the IEDs at the dc electrode shift toward higher energy and the peaks in IADs shift toward the small angle region. At the same time, it also decreases ion-energy at the RF electrode and enlarges the ion-angles which strike the RF electrode. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4768427]