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论文类型：期刊论文

发表时间：2012-04-01

发表刊物：PLASMA SOURCES SCIENCE & TECHNOLOGY

收录刊物：SCIE、EI、Scopus

卷号：21

期号：2

ISSN号：0963-0252

摘要：The electron behaviour in an Ar/CF4 inductively coupled plasma is investigated by a Langmuir probe and a hybrid model. The simulated and measured results include electron density, temperature and electron energy distribution function for different values of Ar/CF4 ratio, coil power and gas pressure. The hybrid plasma equipment model simulations show qualitative agreement with experiment. The effect of F-2 electron attachment on the electron behaviour is explored by comparing two sets of data based on different F atom boundary conditions. It is demonstrated that electron attachment at F-2 molecules is responsible for the depletion of low-energy electrons, causing a density decrease as well as a temperature increase when CF4 is added to an Ar plasma.