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论文类型：期刊论文

发表时间：2010-03-01

发表刊物：REVIEW OF SCIENTIFIC INSTRUMENTS

收录刊物：SCIE、EI

卷号：81

期号：3

ISSN号：0034-6748

关键字：cyclotron resonance; electron density; high-frequency discharges; hydrogen; plasma density; plasma sources; plasma temperature

摘要：Hybrid hydrogen plasma was formed by biasing 13.56 MHz radio-frequency (rf) power on a substrate immersed in 2.45 GHz microwave electron cyclotron resonance (ECR) plasma. The influences of the substrate configuration on plasma characteristics were investigated. With increasing rf self-bias voltage, electron temperature, T(e), increases obviously in the case of the single-electrode substrate, whereas a slight change in T(e) was observed with the double-electrode substrate condition. Electron density rises almost with a same magnitude under both two substrate conditions. It exhibited that electron energy and density in ECR-rf hybrid mode could be adjusted independently by controlling rf discharge with favorable substrate configurations.