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论文类型：期刊论文

发表时间：2008-09-26

发表刊物：VACUUM

收录刊物：SCIE、EI、Scopus

卷号：83

期号：2

页面范围：423-426

ISSN号：0042-207X

关键字：ICP; Magnetic field; Electron temperature; Ion density; Plasma potential

摘要：In this paper, three permanent magnet rings, which were placed alternatively between the three antenna coils of a cylindrical inductively coupled radio frequency (rf) argon plasma for rf enhanced ionized magnetron sputtering system, were used to produce a closed magnetic field distribution with the magnetic field of the unbalanced magnetron sputtering to confine discharge plasma. Langmuir probe measurement was used to study the effect of the magnetic field on the plasma characteristics and their spatial distribution. The results show that the presence of the closed magnetic field leads to the increase of the ion density and the decrease of electron temperature and plasma potential. With the closed magnetic field, the plasma density distribution in radial direction will become more uniform. (C) 2008 Elsevier Ltd. All rights reserved.