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王友年
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教授
博士生导师
硕士生导师
- 性别：男
- 毕业院校：大连工学院
- 学位：硕士
- 所在单位：物理学院
- 学科：等离子体物理
- 办公地点：大连理工大学物理系楼306
- 联系方式：0411-84707307
- 电子邮箱：ynwang@dlut.edu.cn
访问量：
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[261] Wang Shuai, Xu Xiang, Wang Younian, Wang, S (reprint author), Northeastern Univ, Dept Phys, Coll Sci, Shenyang 110891, Peoples R China..A One-Dimensional Hybrid Simulation of DC/RF Combined Driven Capacitive Plasma[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(1):32-36
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[262] Zhao Zhanqiang, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Feature Profile Evolution During Etching of SiO2 in Radio-Frequency or Direct-Current Plasmas[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(1):64-70
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[263] Jiang Xiang-Zhan, Liu Yong-Xin, Bi Zhen-Hua, Lu Wen-Qi, Wang You-Nian, Jiang, XZ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Radial density uniformity of dual frequency capacitively coupled plasma[J],ACTA PHYSICA SINICA,2012,61(1)
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[264] Mao, M., Wang, Y. N., Bogaerts, A., M (reprint author), Univ Antwerp, Dept Chem, Res Grp PLASMANT, Univ Pl 1, B-2610 Antwerp, Belgium..Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/Ar plasmas used for dee[J],JOURNAL OF PHYSICS D-APPLIED PHYSICS,2011,44(43)
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[265] Zhang, Ya, Song, Yuan-Hong, Wang, You-Nian, Y (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Nonlinear wake potential and stopping power for charged particles interacting with a one-dimension[J],PHYSICS OF PLASMAS,2011,18(11)
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[266] Zhang Hong, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Characteristics of a Collisional Sheath Biased by a Dual Frequency Source[J],PLASMA SCIENCE & TECHNOLOGY,2011,13(5):513-518
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[267] Li Xiaosong, Wang Nan, Yang Jinhua, Wang Younian, Zhu Aimin, Zhu, AM (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China..Polysilicon Prepared from SiCl4 by Atmospheric-Pressure Non-Thermal Plasma[J],PLASMA SCIENCE & TECHNOLOGY,2011,13(5):567-570
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[268] 刘永新, 张权治, 姜巍, 侯璐景, 陆文琪, 王友年.双频容性耦合等离子体无碰撞电子反弹共振加热研究[A],2011,1-1
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[269] Bi, Zhen-hua, Liu, Yong-xin, Jiang, Wei, Xu, Xiang, Wang, You-nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..A brief review of dual-frequency capacitively coupled discharges[J],Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and
Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials
(SPSM 2010),2011,11(5):S2-S8
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[270] Hu, Zhang-Hu, Song, Yuan-Hong, Miskovic, Z. L., Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Energy dissipation of ion beam in two-component plasma in the presence of laser irradiation[J],LASER AND PARTICLE BEAMS,2011,29(3):299-304
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[271] Dai, Zhong-Ling, Yue, Guang, Wang, You-Nian, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Study on mechanism of etching in low pressure radio-frequency plasmas[J],Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and
Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials
(SPSM 2010),2011,11(5):S121-S125
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[272] Xu, Xiang, Feng, Jie, Liu, Xiang-Mei, Wang, You-Nian, YN (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Engn, 2 Ling Gong Rd, Dalian 116023, Liao Ning, Peoples R China..Study of the dust removal efficiency in capacitively coupled plasmas with annular electrodes[J],Joint Meeting of the 10th Asia-Pacific Conference on Plasma Science and
Technology (APCPST 2010)/153rd Symposium on Plasma Science for Materials
(SPSM 2010),2011,11(5):S131-S134
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[273] 姜巍, 王虹宇, 张权治, 毕振华, 王友年.iPM:一个用于低温等离子体研究的两维隐式PIC/MC模拟程序[A],2011,87-87
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[274] 赵占强, 戴忠玲, 王友年.射频等离子体刻蚀SiO2的数值研究[A],2011,163-163
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[275] 宋远红, 王友年, 徐翔.低气压射频及甚高频容性耦和等离子体源的发展趋势及相关物理问题[A],2011,7-7
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[276] 刘文耀, 徐勇, 杜永权, 朱爱民, 王友年.光谱法对双频容性耦合CF4/Ar等离子体诊断[A],2011,194-194
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[277] 赵占强, 戴忠玲, 王友年.射频等离子体刻蚀SiO_2的数值研究[A],2011,1
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[278] 高飞, 赵书霞, 王友年.射频感性耦合等离子体放电模式跳变及回滞的实验研究[A],2011,186-186
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[279] 毕振华, 徐翔, 张钰如, 王友年.CCP射频放电流体模型面向加工工艺的仿真应用[A],2011,161-161
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[280] 张权治, 侯璐景, 王友年.电负性容性耦合放电中的电非对称效应的研究[A],2011,210-210
