Current position: Home >> Scientific Research >> Paper Publications

基片温度对TiO2薄膜表面形貌和性能的影响

Release Time:2019-03-11  Hits:

Indexed by: Journal Article

Date of Publication: 2006-06-20

Journal: 材料科学与工程学报

Included Journals: CSCD、ISTIC

Volume: 24

Issue: 3

Page Number: 382-385

ISSN: 1673-2812

Key Words: TiO2薄膜;基片温度;原子力显微镜;表面形貌;表面性能

Abstract: 利用射频磁控溅射设备在玻璃基片上制备TiO2薄膜,采用AFM、UV-Vis分光光度、接触角测定仪等测试手段,研究基片温度对薄膜表面形貌、粗糙度和表面性能的影响.结果表明,随着基片温度增加,薄膜表面粗糙度增大,薄膜中颗粒由无定形态逐渐向定向排列的晶态转变,而薄膜结构、表面形貌和粗糙度的变化明显影响薄膜表面性能.最后,探讨了薄膜的生长机理.

Prev One:生长温度对Ge2Sb2Te5薄膜的相变行为以及微观结构的影响

Next One:Optical and electrical properties of Zn1-xZdxO films grown on Si substrates by reactive-frequency magnetron sputtering