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Hongchen Guo

Professor
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates


Gender:Male
Alma Mater:Dalian University of Technology
Degree:Doctoral Degree
School/Department:School of Chemical Engineering
Discipline:Industrial Catalysis. Physical Chemistry (including Chemical Physics)
Business Address:521 Room,Chemical Engineering Building B,West Campus, Dalian University of Technology.
Contact Information:+86-411-84986120
E-Mail:hongchenguo@dlut.edu.cn
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Current position: Home >> Scientific Research >> Paper Publications

The synthesis of metal phosphides: Reduction of oxide precursors in a hydrogen plasma

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Indexed by:期刊论文

Date of Publication:2008-07-01

Journal:ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Included Journals:SCIE、EI、PubMed、Scopus

Volume:47

Issue:32

Page Number:6052-6054

ISSN No.:1433-7851

Key Words:hydrogen; nickel; plasma chemistry; pnicticles; reduction

Abstract:(Equation Presented) A NiPpy phosphide synthesis: Nickel phosphides such as Ni2P and Ni3P are synthesized stoichiometrically from oxide precursors in a nonthermal hydrogen plasma at atmospheric pressure and low temperature in 60 min (see scheme). This energy- and time-efficient approach can also be applied to the synthesis of other metal phosphides such as GaP, InP, MoP, and WP. © 2008 Wiley-VCH Verlag GmbH & Co. KGaA.