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Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates

Paper Publications

[21]戴忠玲, 王友年.Atomic Layer Etching of Silicon and Silicon Dioxide Under Pulsed RF Substrate Bias[A],2014,1(1):33-33
[22]Zhang, Sai-Qian, Dai, Zhong-Ling, Song, Yuan-Hong, Wang, You-Nian, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Effect of reactant transport on the trench profile evolution for silicon etching in chlorine pl...[J],VACUUM,2014,99:180-188
[23]Bi, Zhen-Hua, Dai, Zhong-Ling, Zhang, Yu-Ru, Liu, Dong-Ping, Wang, You-Nian, ZH (reprint author), Dalian Nationalities Univ, Sch Phys & Mat Engn, Dalian 116600, Peoples R China..Effects of reactor geometry and frequency coupling on dual-frequency capacitively coupled plasm...[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2013,22(5)
[24]张赛谦, 戴忠玲, 宋远红, 王友年.双频容性耦合Ar/CF4等离子体中双频源参数对刻蚀微观不均匀性影响的研究[A],2013,252-252
[25]张赛谦, 戴忠玲, 宋远红, 王友年.双频容性耦合Ar/CF_4等离子体中双频源参数对刻蚀微观不均匀性影响的研究[A],2013,1
[26]Dai, Zhong-Ling, Zhang, Sai-Qian, Wang, You-Nian, SQ (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, 2 Linggong Rd, Dalian 116024, Liaoning, Peoples R China..Study on feature profile evolution for chlorine etching of silicon in an RF biased sheath[J],17th International Conference on Surface Modification of Materials by Ion Beams (SMMIB),2013,89(,SI):197-202
[27]Zhang Saiqian, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Ion Transport to a Photoresist Trench in a Radio Frequency Sheath[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(11):958-964
[28]Dai Zhongling, Yue Guang, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116023, Peoples R China..Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Fr...[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(3):240-244
[29]Zhao Zhanqiang, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Feature Profile Evolution During Etching of SiO2 in Radio-Frequency or Direct-Current Plasmas[J],PLASMA SCIENCE & TECHNOLOGY,2012,14(1):64-70
[30]Zhang Hong, Dai Zhongling, Wang Younian, Dai, ZL (reprint author), Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China..Characteristics of a Collisional Sheath Biased by a Dual Frequency Source[J],PLASMA SCIENCE & TECHNOLOGY,2011,13(5):513-518

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