Hits:
Date of Publication:2022-10-03
Journal:AICHE JOURNAL
Affiliation of Author(s):化工学院
Volume:64
Issue:3
Page Number:981-992
ISSN No.:0001-1541
Pre One:Theoretical analysis of ion kinetic energies and DLC film deposition by CH4+Ar(He) dielectric barrier discharge plasmas
Next One:The quenching effect of hydrogen on the nitrogen in metastable state in atmospheric-pressure N2-H2 microwave plasma torch