大连理工大学主页平台管理系统张家良 Synthesis of Mo2M and Mo2-xTixN thin films by ion beam enhanced deposition method and their structure and properties Home

Current position: Home >> Scientific Research >> Paper Publications

Theoretical analysis of ion kinetic energies and DLC film deposition by CH4+Ar(He) dielectric barrier discharge plasmas

Release Time:2024-02-29 Hits:

Date of Publication: 2022-10-03

Journal: Chinese Phys

Institution: 物理学院

Volume: 16

Issue: 9

Page Number: 2809-2813

ISSN: 1009-1963

Prev One:The effect of methane gas flow rate on the streamer propagation i n an atmospheric-pressure methane-air plasma jet

Next One:The Promotion of Argon and Water Molecule on Direct Synthesis of H2O2 from H-2 and O-2