常温下采用射频等离子体法合成碳化硅膜
Release Time:2024-02-29 Hits:
Indexed by: Journal Article
Date of Publication: 2022-06-30
Journal: 真空
Volume: 42
Issue: 2
Page Number: 27-30
ISSN: 1002-0322
Note: 新增回溯数据
Release Time:2024-02-29 Hits:
Indexed by: Journal Article
Date of Publication: 2022-06-30
Journal: 真空
Volume: 42
Issue: 2
Page Number: 27-30
ISSN: 1002-0322
Note: 新增回溯数据