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常温下采用射频等离子体法合成碳化硅膜

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Indexed by:期刊论文

Date of Publication:2022-06-30

Journal:真空

Volume:42

Issue:2

Page Number:27-30

ISSN No.:1002-0322

Note:新增回溯数据

Pre One:Effect of Transmission Line on Impedance Matching of Atmospheric-Pressure Radio-Frequency Capacitive Microplasma Discharge

Next One:微脉冲等离子体推力器放电过程和性能初探
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