Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2013-03-01

Journal: MATERIALS LETTERS

Included Journals: EI、SCIE

Volume: 95

Page Number: 135-138

ISSN: 0167-577X

Key Words: Surface work function; InN; Thin films; Surfaces; Annealing

Abstract: Annealing studies were performed to investigate the effects of heat treatment on InN thin films by changing the annealing condition from vacuum to high pressure N-2. A significant variation of similar to 400 meV in the surface work function was observed for InN films. The basic principles of Kelvin probe measurement revealed that the surface band bending E-SBB is crucial in investigating the significant changes of surface work function on the InN. The stoichiometric ratio imbalance of In and N was indirectly determined to be the main cause of the variation in band bending by analyzing the X-ray diffraction and energy dispersive X-ray measurements. Thus, the annealing treatment could be an effective method to adjust the surface work function of InN by changing the annealing condition from vacuum to high pressure N-2. (C) 2012 Elsevier B.V. All rights reserved.