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Indexed by:期刊论文

Date of Publication:2013-03-01

Journal:MATERIALS LETTERS

Included Journals:SCIE、EI

Volume:95

Page Number:135-138

ISSN No.:0167-577X

Key Words:Surface work function; InN; Thin films; Surfaces; Annealing

Abstract:Annealing studies were performed to investigate the effects of heat treatment on InN thin films by changing the annealing condition from vacuum to high pressure N-2. A significant variation of similar to 400 meV in the surface work function was observed for InN films. The basic principles of Kelvin probe measurement revealed that the surface band bending E-SBB is crucial in investigating the significant changes of surface work function on the InN. The stoichiometric ratio imbalance of In and N was indirectly determined to be the main cause of the variation in band bending by analyzing the X-ray diffraction and energy dispersive X-ray measurements. Thus, the annealing treatment could be an effective method to adjust the surface work function of InN by changing the annealing condition from vacuum to high pressure N-2. (C) 2012 Elsevier B.V. All rights reserved.