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Indexed by:期刊论文

Date of Publication:2010-10-01

Journal:THIN SOLID FILMS

Included Journals:SCIE、EI、Scopus

Volume:518

Issue:24,SI

Page Number:7390-7393

ISSN No.:0040-6090

Key Words:beta-FeSi2; Magnetron sputtering; Iron silicon film; Microstructure

Abstract:The preparation of iron-silicon films was performed onto Si (100) substrates by microwave electron cyclotron resonance (ECR) plasma source enhanced unbalance magnetron sputtering. The compositions, microstructures and properties of films under different sputtering powers and annealing conditions were characterized by AES, GAXRD, TEM and absorption spectrum techniques. The results described that the amorphous iron silicon films can be easily prepared by unbalance magnetron sputtering. Even the Fe/Si ratio deviated far from 1:2, such as Fe/Si = 1:14.8 or 1:10, the amorphous iron silicon film with semiconductor properties can also be obtained, which suggests that the Fe/Si ratio is not the only factor to determine whether the samples have semiconducting properties in iron silicon amorphous. After annealing at 850 degrees C for 4 h, the microstructure of nanometer beta-FeSi2 embedded into amorphous Si still possesses semiconducting characteristics. (C) 2010 Elsevier B.V. All rights reserved.