Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2013-08-01

Journal: PLASMA PROCESSES AND POLYMERS

Included Journals: Scopus、EI、SCIE

Volume: 10

Issue: 8

Page Number: 698-705

ISSN: 1612-8850

Key Words: atmospheric-pressure; cold plasma; homogeneous; inactivation application; resistant fungi cell

Abstract: A surface discharge device composed of microns-thick hollow quartz fibers is used to inactivate resistant fungi cells. The homogeneous cold plasmas are generated by using a pulse high-voltage source with the repetition frequency of 150 Hz at atmospheric-pressure. Increasing pulse voltage slightly from 26 to 34 kV leads to an obvious improvement in the inactivation efficiency of fungi cells. The atmospheric-pressure air plasma generated at the pulse voltage of 34kV is found to kill the fungi cells as much as 99% within a treatment time of 5min. The inactivation efficiency is systematically investigated as a function of the processing depth of surface plasma. Various measurements indicate that plasma activated derivatives, such as OH, O, O-3, and charged species play a key role in this plasma inactivation process.