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Indexed by:期刊论文

Date of Publication:2018-01-01

Journal:RSC ADVANCES

Included Journals:SCIE

Volume:8

Issue:57

Page Number:32899-32908

ISSN No.:2046-2069

Abstract:Major problems currently limiting the widespread application of phthalonitrile resins are the high precursor melting point and volatility of the curing agent. Herein, a novel self-curing triphenol A-based phthalonitrile resin precursor (TPPA-Ph) was successfully synthesized by reacting ,,-tris(4-hydroxyphenyl)-1-ethyl-4-isopropylbenzene (TPPA) with 4-nitrophthalonitrile (NPh) via nucleophilic substitution. The presence of residual phenolic hydroxyl groups in the TPPA-Ph precursor promoted the curing reaction of phthalonitrile resin in the absence of an additional curing reagent. Self-cured TPPA-Ph resins exhibited relatively low melting points (less than 100 degrees C), high thermal stability, and a wide processing window (116 degrees C). Furthermore, the TPPA-Ph precursors contained phenolic hydroxyl and cyano groups that can be used as flexibilizers and curing agents to optimize other phthalonitrile resins. Resorcinol-based phthalonitrile resin (DPPH) cured with various amounts of TPPA-Ph possessed excellent thermal and thermo-oxidative stability with a 5% weight loss temperature exceeding 530 degrees C, T(g)s above 380 degrees C, and a wide processing window and time. Therefore, as a novel precursor and curing agent for phthalonitrile resins, the triphenol A-based phthalonitrile resin is an ideal resin matrix for high-performance composites with broad application prospects in aerospace, shipping, machinery, and other high-tech fields.