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用于大尺寸金刚石晶圆超精密低损伤抛光的抛光液及制备方法

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First Author:jinzhuji

Disigner of the Invention:苑泽伟,董伯先,Renke Kang

Application Number:CN200810012181.4

Authorization Date:2008-07-03

Authorization number:CN101302403

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