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A study of the effect of optical parameters on the performance of diamond photo-assisted chemical mechanical polishing - Based on ReaxFF MD molecular dynamics simulations

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Date of Publication:2025-10-24

Journal:Diamond & Related Materials

Issue:PB

Page Number:112858-112858

ISSN No.:0925-9635

Key Words:CMP; Diamond; MRR; ReaxFF MD; RMS; UV light intensity

Next One:Insights into the surface oxidation modification mechanism of nano-diamond: An atomistic understanding from ReaxFF simulations

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Gender:Female

Alma Mater:大连理工大学

Degree:Doctoral Degree

School/Department:机械工程学院

Discipline:Mechanical Manufacture and Automation

Business Address:机械工程学院知方楼5011

Contact Information:guoxg@dlut.edu.cn,15942684586(微信号)

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