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个人信息Personal Information
教授
博士生导师
硕士生导师
性别:女
毕业院校:东北大学
学位:博士
所在单位:机械工程学院
学科:机械制造及其自动化. 微机电工程. 机械电子工程
办公地点:西部校区机械学院新大楼6009房间
电子邮箱:duliqun@dlut.edu.cn
Investigation on internal stress of SU-8 photoresist film
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论文类型:会议论文
发表时间:2013-07-01
收录刊物:EI
卷号:613
页面范围:251-258
摘要:In this paper, substrate curvature method was adopted and a theory model based on Stoney's formula was built for obtaining the internal stress of SU-8 film. The effect of substrate diameter, film thickness and post-baked temperature on substrate curvature ratio was investigated by ANSYS simulation. The analytical result shows that post-baked temperature is the main effect factor on internal stress of SU-8 film. In addition, internal stresses of SU-8 at three different post-temperatures (55°C, 70°C and 85°C) are measured. The results show that the experimental results greatly agreed with simulation analytical results. It means the internal stress of SU-8 film can be accurately described by the theory model, which provides a basis for the quantitative analysis of the internal stress in SU-8 film. © (2014) Trans Tech Publications, Switzerland.