杜立群
156

个人信息Personal Information

教授

博士生导师

硕士生导师

性别:女

毕业院校:东北大学

学位:博士

所在单位:机械工程学院

学科:机械制造及其自动化. 微机电工程. 机械电子工程

办公地点:西部校区机械学院新大楼6009房间

电子邮箱:duliqun@dlut.edu.cn

扫描关注

论文成果

当前位置: 中文主页 >> 科学研究 >> 论文成果

金属表面微坑阵列掩膜电化学刻蚀技术研究

点击次数:

发表时间:2022-10-09

发表刊物:电加工与模具

所属单位:机械工程学院

期号:2

页面范围:29-32,37

ISSN号:1009-279X

摘要:The mask film for the micro pit array was manufactured by using negative photoresist lithography process,then experiments were made to analyze the effect of the polishing process on uniformity of the etching,so as to ultimately solve the problem of the etching defect. The influence of the pickling on the substrate was studied ,it was found that pickling can improve the etching uniformity,then precipitation problem was solved by adjusting the pH of the solution. The influence of the mask aperture on the electrochemical etching was analyzed. The micro pit array with the diameter of 60 μm and depth of 11 μm was fabricated by the self-established electrochemical etching equipment. The results verify the feasibility of the mask electrochemical etching ,which means that the proposed process can provide a referenced scheme for the production of micropattern on the metal surface.

备注:新增回溯数据