Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2014-12-01

Journal: SURFACE ENGINEERING

Included Journals: Scopus、EI、SCIE

Volume: 30

Issue: 12

Page Number: 900-904

ISSN: 0267-0844

Key Words: Thickness; Roughness; Amorphous; Hardness

Abstract: This work explored the effect of deposition pressure on the properties of the ternary Al-Mg-B thin films deposited on Si substrate at high deposition temperature (600 degrees C) by magnetron sputtering system with one pure boron target and one Al/Mg co-target. The influences of the deposition pressure on the elemental contents, deposition rate, surface roughness, structure and mechanical properties were investigated by Electron microprobe analysis (EPMA), 3D surface profiler, X-ray diffraction (XRD), Fourier transforms infrared spectroscopy (FTIR), and nanoindentation experiments respectively. Experimental results indicated that the amorphous thin films deposited at 0.5 Pa had a smooth surface and displayed the maximum hardness and Young's modulus of 35 and 322 GPa respectively. From the results of this work, high quality Al-Mg-B hard thin films can be obtained by magnetron sputtering under an optimum deposition pressure of 0.5 Pa.