Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2009-12-15

Journal: SURFACE & COATINGS TECHNOLOGY

Included Journals: Scopus、EI、SCIE

Volume: 204

Issue: 5

Page Number: 713-717

ISSN: 0257-8972

Key Words: Magnetron sputtering; Bond content; BCN

Abstract: Using radio frequency reactive magnetron sputtering technique with boron and graphite targets, amorphous B-C-N films were synthesized on the silicon (100) substrate applied with different temperatures and bias voltages. The structural and bonding characteristics of the synthesized films were characterized by Fourier transform infrared spectroscopy (FTIR) and X-ray phortoelectron spectroscopy (XPS). The bond contents in the B-C-N films show remarkable dependence on the bias voltage applied to the substrate at 400 degrees C. (C) 2009 Elsevier B.V. All rights reserved.