High quality p-type ZnO films grown by low pressure plasma-assisted MOCVD with N2O rf plasma doping source
Release Time:2022-10-03 Hits:
Date of Publication: 2022-10-03
Journal: JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
Institution: 物理学院
Volume: 204
Issue: 1-3
Page Number: 481-485
ISSN: 0924-0136