谭毅Yi Tan

(教授)

 博士生导师  硕士生导师
学位:博士
性别:男
毕业院校:东京工业大学
所在单位:材料科学与工程学院
电子邮箱:tanyi@dlut.edu.cn

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电子束熔炼多晶硅对杂质铝去除机制研究

发表时间:2022-06-19 点击次数:

论文名称:电子束熔炼多晶硅对杂质铝去除机制研究
发表刊物:材料工程
所属单位:材料科学与工程学院
期号:8
页面范围:8-11
ISSN号:1001-4381
摘要:Aluminum impurity with high vapor pressure in metallurgical grade silicon was removed effectively by electron beam melting. Comparing the calculated value and the measure evaporation loss, the mechanism of aluminum evaporation through the surface of the molten silicon can be assumed that the removal rate-limiting step of aluminum impurity in silicon is diffusion step. In addition, the relationship between the removal amount of the aluminum and silicon loss is also discussed.
备注:新增回溯数据
发表时间:2010-01-01