Current position: Home >> Scientific Research >> Patents

低电阻率高热稳定性的Cu-Ni-Mo合金薄膜及其制备工艺

Release Time:2019-03-25  Hits:

First Author: 李晓娜

Disigner of the Invention: 董闯,王清,朱瑾,张心怡

Authorization Number: ZL 201080067138.3

Prev One:基于Fe-B-Y团簇的Fe基块体非晶合金

Next One:Thin Film of Copper-Nickel-Molybdenum Alloy and Method for Manufacturing the Same.