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Indexed by:期刊论文

Date of Publication:2008-11-01

Journal:IONICS

Included Journals:SCIE、EI

Volume:14

Issue:6

Page Number:471-476

ISSN No.:0947-7047

Key Words:Lanthanum silicate; Apatite structure; IT-SOFC; Magnetron sputtering

Abstract:Apatite-type La9.33Si6O26 thin films were elaborated by co-sputtering of two metallic La and Si targets powered, respectively, by high power impulse magnetron sputtering and direct current sources, in pure Ar atmosphere, followed by a subsequent high temperature oxidation treatment in air. The structural and chemical features of these films have been assessed by X-ray diffraction and scanning electron microscopy (SEM). The film with near lanthanum silicate La/Si atomic ratio deposited on a porous Ni-YSZ cermet substrates was initially amorphous. After thermal oxidation at 1,173 K in air, the coating crystallised under the expected apatite structure. SEM observation revealed that both film compactness and thickness increased after thermal oxidation. The conductivity evolution with temperature of the pure apatite-like lanthanum silicate coatings, as measured by complex impedance spectroscopy, showed that the activation energy of is quite low compared to the literature data.