Release Time:2019-11-01  Hits:

Indexed by: Journal Article

Date of Publication: 2008-11-01

Journal: IONICS

Included Journals: EI、SCIE

Volume: 14

Issue: 6

Page Number: 471-476

ISSN: 0947-7047

Key Words: Lanthanum silicate; Apatite structure; IT-SOFC; Magnetron sputtering

Abstract: Apatite-type La9.33Si6O26 thin films were elaborated by co-sputtering of two metallic La and Si targets powered, respectively, by high power impulse magnetron sputtering and direct current sources, in pure Ar atmosphere, followed by a subsequent high temperature oxidation treatment in air. The structural and chemical features of these films have been assessed by X-ray diffraction and scanning electron microscopy (SEM). The film with near lanthanum silicate La/Si atomic ratio deposited on a porous Ni-YSZ cermet substrates was initially amorphous. After thermal oxidation at 1,173 K in air, the coating crystallised under the expected apatite structure. SEM observation revealed that both film compactness and thickness increased after thermal oxidation. The conductivity evolution with temperature of the pure apatite-like lanthanum silicate coatings, as measured by complex impedance spectroscopy, showed that the activation energy of is quite low compared to the literature data.