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射频磁控溅射制备Mn掺杂ZnO薄膜的结构与光学性能

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Indexed by:期刊论文

Date of Publication:2011-06-20

Journal:功能材料

Included Journals:PKU、ISTIC

Volume:42

Issue:z3

Page Number:536-540

ISSN No.:1001-9731

Key Words:Mn掺杂ZnO薄膜;射频磁控溅射;微结构;光学特性

Abstract:采用反应射频磁控溅射方法制备Zn1-xMnxO薄膜(0≤x≤0.25),并在不同温度下进行退火处理.通过原子力显微镜、薄膜X射线衍射、透射电子显微镜和透射光谱对薄膜的成分、表面形貌、微结构和光学性质进行了研究.结果表明,薄膜结晶质量明显地依赖于掺杂Mn元素的浓度,所有薄膜都表现了沿(002)晶面方向择优取向生长,当Mn含量为7%时,Mn完全进入ZnO晶格,无纳米级第二相析出,当Mn含量超过13%时,会有ZnMnO3杂相析出.Mn掺杂ZnO薄膜(Zn1-xMnxO,s≈0.07)经600~800℃退火处理后,薄膜的光学带隙发生蓝移,带隙能由3.17eV升高到3.27eV,当退火温度高于700℃时,薄膜中压应力得到释放.

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