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个人信息Personal Information
副教授
硕士生导师
性别：男
毕业院校：大连理工大学
学位：博士
所在单位：材料科学与工程学院
学科：材料加工工程. 材料表面工程
办公地点：大连甘井子区软件园路80号大连理工大学科技园大厦B座510房间
联系方式：HANDY:13998509875 TEL: 86-411-84706561-8051 FAX: 86-411-84788732 deng@dlut.edu.cn 191753572@qq.com
电子邮箱：deng@dlut.edu.cn
Effects of substrate bias on structure and mechanical properties of AlCrTiWNbTa coatings
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论文类型：期刊论文
发表时间：2013-11-01
发表刊物：SURFACE ENGINEERING
收录刊物：SCIE、EI、Scopus
卷号：29
期号：10
页面范围：778-782
ISSN号：0267-0844
关键字：Multicomponent alloys films; Hardness; Amorphous; Bias voltage
摘要：AlCrTiWNbTa multielements high entropy alloy films have been synthesised by using magnetron co-sputtering of three binary alloy targets. Effects of substrate bias on the microstructure and mechanical properties of the films are studied. The composition and the crystallographic structure of the films are characterised by an electron probe microanalyser (EPMA) and an X-ray diffractometer respectively. The surface micrographs of the films are described by atomic force microscope (AFM). The microhardness and elastic modulus of the films are measured using a nanoindenter. It is found that the deposition rate of the AlTiWTaNbCr films decreases as the increase in the bias voltage. The microstructure of the deposited films is amorphous. The microhardness and elastic modulus of the films keep at about 12.5 and 180 GPa respectively. The surface roughness is in the range of 0.3-0.5 nm.