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    余隽

    • 副教授     博士生导师 硕士生导师
    • 任职 : 仪器仪表学会传感器分会理事;中国仪器仪表学会微纳器件与系统技术分会理事;IEEE会员
    • 性别:女
    • 毕业院校:大连理工大学
    • 学位:博士
    • 所在单位:生物医学工程学院
    • 学科:微电子学与固体电子学. 生物医学工程. 电路与系统
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    Substrate effects on the thermal performance of in-plane graphene/hexagonal boron nitride heterostructures

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      发布时间:2019-03-11

      论文类型:期刊论文

      发表时间:2018-04-01

      发表刊物:CARBON

      收录刊物:EI、SCIE

      卷号:130

      页面范围:396-400

      ISSN号:0008-6223

      关键字:Graphene; Hexagonal boron nitride; Two-dimensional heterostructures; Interfacial thermal conductance; Molecular dynamics

      摘要:Interfacial thermal conductance G and effective thermal conductivity k of both freestanding and silica supported in-plane graphene/hexagonal boron nitride (Gr/h-BN) heterostructures are investigated via molecular dynamics simulations. The predicted G values (similar to 10(10) Wm(-2)K(-1)) are 3-4 orders larger than that of the van der Waals interfaces. Thermal rectification is found in such Gr/h-BN heterostructures for both freestanding and supported ones due to the mismatch of phonon spectra interrelated with temperature. Compared to the freestanding Gr/h-BN, an enhancement in the interfacial thermal transport is observed in supported ones and G becomes larger with increased substrate coupling. The calculated k is about 116-130 Wm(-1)K(-1) for both freestanding and supported Gr/h-BN heterostructures in the temperature range from 200 to 600 K. A weaker temperature dependence is found in the k values compared with that of G, which is resulted from the inconsistent variation of thermal transport in single materials and across the interface with temperature. Our study offers perspectives of modulating thermal properties of two-dimensional heterostructures through surface interactions with the substrate, which can contribute to promoting its potential applications. (c) 2018 Elsevier Ltd. All rights reserved.