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论文类型：期刊论文

发表时间：2020-02-01

发表刊物：JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

收录刊物：EI、SCIE

卷号：31

期号：3

页面范围：2347-2352

ISSN号：0957-4522

摘要：Polydimethylsiloxane (PDMS) metallization has been extensively used in varieties of micro- and nanosystem technologies. However, the deposited metal film on the PDMS surface is prone to wrinkling because of a large thermal mismatch stress, which may cause difficulties in some applications. In this work, a simple transfer printing method via a poly(acrylic acid) (PAA) sacrificial layer for PDMS metallization is presented. A PAA film was spin-coated on the silicon substrate, metal patterns were fabricated on the PAA film based on photolithography techniques, and a PDMS sheet was put on the surface of metal patterns and separated with metal patterns from the silicon substrate by dissolving the PAA film in room-temperature water. Au patterns with a variety of shapes and sizes were successfully transferred on the PDMS sheet, and there were no wrinkles in Au patterns. As a demonstration, a PDMS-based tunable diffraction grating with a line width of 2 mu m and an initial period of 4 mu m was fabricated. The grating displayed excellent diffraction efficiencies, and the period could be tuned by simply stretching the grating.