点击次数：

论文类型：期刊论文

发表时间：2013-03-01

发表刊物：17th International Conference on Surface Modification of Materials by Ion Beams (SMMIB)

收录刊物：SCIE、EI、CPCI-S、Scopus

卷号：89

期号：,SI

页面范围：203-208

ISSN号：0042-207X

关键字：MoSx-Ta film; Doping Ta; Tribological properties

摘要：Sputter-deposited MoS2 films have been often used as dry lubricant in various industrial fields, such as space application and much attention has been paid to reduction of friction coefficient and improvement of mechanical properties in recent decades. One way to achieve this is to deposit a MoS2 film doped with another metal. The MoSx-metal films were found to be denser, more adhesive and more oxidation-resistant than pure MoS2. In this study, MoSx-Ta composite films were synthesized by Electron Cyclotron Resonance microwave source enhanced DC sputtering with different target powers. The effects of doping Ta on mechanical properties of MoSx-Ta films were investigated. The morphology and structure of films were investigated using a scanning electron microscope (SEM), X-ray diffraction (XRD) and atomic force microscopy (AFM). The microhardness was evaluated using microhardness test instrument, and the adhesion strengths were obtained using a scratch tester. The results showed that the S/Mo ratio was influenced by the dc sputtering target power. Typical MoS2 (100) (103) (002) orientations were present in pure MoSx films, but disappeared with the increase in doped Ta, with the S/Mo content ratios decreasing from 1.52 to 0.84, and the hardness increasing from 3.55 to 15.23 GPa. The roughness and surface topography, friction coefficient and adhesion were significantly affected by the Ta, Mo and S content. The content of doped Ta plays a dominant role on the change in the Mo/S ratio, thereby influencing the mechanical and tribological properties of the MoSx-Ta composite films. Crown Copyright (C) 2012 Published by Elsevier Ltd. All rights reserved.