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论文类型：期刊论文

发表时间：2010-06-01

发表刊物：RARE METAL MATERIALS AND ENGINEERING

收录刊物：SCIE、PKU、ISTIC

卷号：39

页面范围：212-215

ISSN号：1002-185X

关键字：reactive magnetron sputtering; ion implantation; TaN; wear behavior

摘要：TaN films were prepared by microwave enhanced reactive magnetron sputtering, plasma immersion implantation and their combination. Structures of products were characterized by X-ray diffraction (XRD), the friction coefficient and wear behaviors were measured by UMT-2 tribometer and Phase Shift MicorXAM-3D was used for analyzing the profiles. The results show that TaN films combined with Ta ion implantation improve the wear behaviors of materials. In all samples, Ta ion implanted with Ta/TaN (soft/hard) multilayer shows the best anti-wear ability, which means that this process method effectively integrates advantages of the two crafts, and is propitious to the improvement of the mechanical actions in the films.