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论文类型：期刊论文

发表时间：2008-08-15

发表刊物：SURFACE & COATINGS TECHNOLOGY

收录刊物：SCIE、EI、Scopus

卷号：202

期号：24

页面范围：5947-5952

ISSN号：0257-8972

关键字：DLC; La2O3; CeO2; Microstructure; Unbalanced magnetron sputtering

摘要：Seven kinds of hydrogen-free La2O3 and CeO2 doped DLC films with thickness of 220-280 nm were deposited on Si (100) substrates by unbalanced magnetron sputtering. Nanoparticles with diameter of 20-30 nm are formed on the surface of films. The surface roughness Ra of films is in the range of 1.5-2.0 nm. C, La, Ce and O elements distribute uniformly along the depth direction, and C, La, and Ce elements diffuse into the Si substrate at the interface. X-ray photoelectron spectroscopy confirms that the La2O3 and CeO2 form within the DLC amorphous films, and Raman spectra indicate the obvious amorphous characteristics of DLC films. High-resolution transmission electron microscopy shows the nanocrystallines structure with diameter of 2-3 nm of 16% La2O3 and 10% CeO2 doped DLC films, and Fourier transformation spectroscopy also exhibits the obvious crystalline characteristics. In this work, the microstructure of two kinds of rare earth oxides doped DLC composite films is measured and analyzed. (C) 2008 Elsevier B.V. All rights reserved