Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2015-02-01

Journal: ACS CATALYSIS

Included Journals: ESI高被引论文、Scopus、EI、SCIE

Volume: 5

Issue: 2

Page Number: 627-630

ISSN: 2155-5435

Key Words: water splitting; copper; electrocatalysis; water oxidation; thin film

Abstract: A robust water oxidation catalyst based on copper oxide was prepared by facile electrodeposition of Cu2+ from borate buffer solution under near neutral conditions. The Cu-B-i thin film exhibits high activity and long-term stability in Cu2+-free pH 9 borate buffer. A steady current density of 1.2 mA/cm(2) was sustained for at least 10 h at 1.3 V versus NHE without iR compensation, which sets a new benchmark for copper-based OEC.