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In Situ Growth of Leakage-Free Direct-Bridging GaN Nanowires: Application to Gas Sensors for Long-Term Stability, Low Power Consumption, and Sub-ppb Detection Limit

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Indexed by:Journal Papers

Date of Publication:2019-06-12

Journal:Nano letters

Included Journals:PubMed

Volume:19

Issue:6

Page Number:3448-3456

ISSN No.:1530-6992

Key Words:GaN,bridge,bypass current,gas sensor,nanowire,parasitic deposition

Abstract:Direct-bridge growth of aligned GaN nanowires (NWs) over the trench of GaN-coated sapphire substrate was realized in which the issues of parasitic deposition and resultant bypass current were resolved by combining the novel shadowing effect of the deep trench with the surface-passivation effect of the SiO2 coating. Due to the robust connection and the absence of a contact barrier in bridging NWs, the intrinsic sensing properties of the NW itself can be obtained. For the first time, the gas-sensing properties (e.g., NO2) of the bridging GaN NWs were studied. With the assistance of UV light, the detection limit was improved from 4.5 to 0.5 ppb at room temperature, and the corresponding response time was reduced from 518 to 18 s. This kind of sensor is promising for high sensitivity (detection of less than parts per billion), low power consumption (capable of room-temperature operation), high stability (variation in resistance of <0.8% during 240 days), and in situ monolithic integration.

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