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Indexed by:期刊论文

Date of Publication:2017-03-10

Journal:ELECTROCHIMICA ACTA

Included Journals:SCIE、EI、Scopus

Volume:230

Page Number:501-507

ISSN No.:0013-4686

Key Words:Water oxidation; Electrodeposition; Copper based film; Electrocatalyst

Abstract:Water splitting is deemed as an effective pathway for producing ideal clean energy, such as hydrogen. Here, a copper oxide film (Cu-Tris film) was prepared in-situ from a 0.2 M phosphate buffer solution (pH =12.0) containing 1.0mM Cu2+ and 2.0mM Tris via controlled-potential electrodeposition. The CuTris film showed a significantly low overpotential of 390 mV at a cdrrent density of 1.0 mA/cm(2) for electrocatalytic water oxidation. Simultaneously, a considerably low Tafel slope of 41 mV/decade was achieved. This Cu-Tris film also exhibited a high and stable current derfSity of ca. 7.5 mA/cm(2) at 1.15 V vs. NHE for long-term electrocatalysis (10 h). These results demonstrated the superior performance of the developed Cu-Tris film, which should be attributed to the regulating effect of the five coordinated planar structure of the Cu-Tris complex precursor during the process of electrodeposition. (C) 2017 Elsevier Ltd. All rights reserved.