Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-doped HfO(2 )films formed by reactive sputtering
Release Time:2022-06-10 Hits:
Date of Publication: 2018-01-01
Journal: CERAMICS INTERNATIONAL
Volume: 44
Issue: 11
Page Number: 12841-12846
ISSN: 0272-8842