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Date of Publication:2014-01-01
Journal:周口师范学院学报
Volume:31
Issue:2
Page Number:52-55,60
ISSN No.:1671-9476
Pre One:一阶回转曲线图谱法及其在HfO2基铁电薄膜极化翻转行为研究中的应用
Next One:Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-doped HfO(2 )films formed by reactive sputtering