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Effect of Y2O3 interlayer on the electric properties of Y-doped HfO2 film deposited by chemical solution deposition

Release Time:2024-04-29  Hits:

Indexed by: Journal Papers

Document Code: 362052

Date of Publication: 2023-03-01

Journal: CERAMICS INTERNATIONAL

Volume: 49

Issue: 5

Page Number: 7670-7675

ISSN: 0272-8842

Key Words: FERROELECTRICITY; HAFNIUM OXIDE; LAYER; MICROSTRUCTURE; SURFACE; THICKNESS

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