Current position: Home >> Scientific Research >> Paper Publications

Effect of Y2O3 interlayer on the electric properties of Y-doped HfO2 film deposited by chemical solution deposition

Release Time:2024-04-29  Hits:

Journal: Ceramics International

Volume: 49

Issue: 5

Page Number: 7670-7675

ISSN: 0272-8842

Prev One:基于冷冻铸造法制备二氧化钛多孔陶瓷

Next One:Energy storage performance of in-situ grown titanium nitride current collector/titanium oxynitride laminated thin film electrodes