衬底偏压对反应磁控共溅射Y∶HfO_2薄膜电学性能的影响
Release Time:2024-04-29 Hits:
Indexed by: Journal Papers
Document Code: 387260
Date of Publication: 2023-01-01
Journal: 材料科学与工艺
Volume: 31
Issue: 5
Page Number: 16-23
ISSN: 1005-0299
CN: 23-1345/TB
Release Time:2024-04-29 Hits:
Indexed by: Journal Papers
Document Code: 387260
Date of Publication: 2023-01-01
Journal: 材料科学与工艺
Volume: 31
Issue: 5
Page Number: 16-23
ISSN: 1005-0299
CN: 23-1345/TB