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衬底偏压对反应磁控共溅射 Y∶HfO2薄膜电学性能的影响

Release Time:2024-04-29  Hits:

Date of Publication: 2024-03-30

Journal: Material Science and Technology

Volume: 31

Issue: 5

Page Number: 16-23

ISSN: 1005-0299

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