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Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO2 films

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Date of Publication:2022-10-08

Journal:Chinese Physics B

Volume:27

Issue:4

ISSN No.:1674-1056

Pre One:Structrual and Electrical Properties of Reactive Magnetron Sputtered Yttrium-doped HfO2 Films

Next One:Spray granulation of Fe and C nanoparticles and their impedance match for microwave absorption
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