location： Current position: Home >> Scientific Research >> Paper Publications

Structrual and Electrical Properties of Reactive Magnetron Sputtered Yttrium-doped HfO2 Films

Hits:

Date of Publication:2022-10-08

Journal:Chinese Physics B

Affiliation of Author(s):物理学院

Volume:27

Issue:4

Page Number:481031-481036

Pre One:Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage

Next One:Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO2 films
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep