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Optimizing Annealing Process for Ferroelectric Y-Doped HfO2 Thin Films by All-Inorganic Aqueous Precursor Solution

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Date of Publication:2022-10-07

Journal:ADVANCED ELECTRONIC MATERIALS

Volume:7

Issue:2

ISSN No.:2199-160X

Key Words:"annealing; chemical solution deposition; ferroelectrics; HfO2; thin films"

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