Optimizing Annealing Process for Ferroelectric Y-Doped HfO2 Thin Films by All-Inorganic Aqueous Precursor Solution
Release Time:2024-04-29 Hits:
Date of Publication: 2022-10-07
Journal: ADVANCED ELECTRONIC MATERIALS
Volume: 7
Issue: 2
ISSN: 2199-160X
Key Words: "annealing; chemical solution deposition; ferroelectrics; HfO2; thin films"