Hits:
Date of Publication:2022-10-03
Journal:APPLIED PHYSICS LETTERS
Affiliation of Author(s):材料科学与工程学院
Volume:100
Issue:8
ISSN No.:0003-6951
Pre One:Importance of tailoring the thickness of SiO2 interlayer in the observation of ferroelectric characteristics in yttrium doped HfO2 films on silicon
Next One:Leaching behaviour and environmental risk assessment of heavy metals from electronic solder in acidified soil